Lab Platform

 Sirus T2 Table Top Reactive Ion Etch (RIE) System

 

The Sirus T2 Reactive Ion Etcher is a basic plasma etching system designed to etch dielectrics and other films that require fluorine-based chemistries. The small footprint and robust design make it ideal for the lab environment.

 

Applications

 

MEMS, Solid State Lighting, Failure Analysis, Research & Development, Pilot Line.

 

alt Brochure - Sirus T2 Table Top RIE System

 


 

Orion III Plasma Enhanced Chemical Vapor Deposition (PECVD) System      

The Orion III PECVD system produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The system meets all safety, facility and process requirements within the laboratory and pilot line production environments. The Orion III has many standard features not typically found on a system so reasonably priced, which is why many users worldwide have made it their PECVD system of choice.          

"I've found both  machines [Orion PECVD and Phantom RIE] to be quite robust, indestructible by  comparison to some other lab equipment." - Lee M. Fischer, National Institute  for Nanotechnology, University   of Alberta

Applications

MEMS, Solid State Lighting, Failure Analysis, Research & Development, Pilot Line.

 

 alt Brochure - Orion III PECVD System

 


 

 

Phantom III Reactive Ion Etch (RIE) System

The Phantom III RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design built on a space-saving platform.             

"Frankly, the Phantom has been a GREAT machine since I have been a user. For this machine that has been at least 10 years. This Phantom was purchased originally by Philips where I used to work. The Phantom has followed me to Sipex and now Exar. I can't imagine living without it. It has been one of the best made and reliable plasma etchers I have used in my over 20-year career." - Don Breedlove, Failure Analysis Engineer, Exar Corporation.

Applications

MEMS, Solid State Lighting, Failure Analysis, Reserach & Development, Pilot Line.

 

alt Brochure - Phantom III RIE System

 


 

 

Minilock-Orion III 

Plasma Enhanced Chemical Vapor Deposition (PECVD) System with a Vacuum Loadlock

The Minilock-Orion III is a PECVD system with a vacuum loadlock that produces production-quality films on a compact platform. The  unique reactor design produces low stress films with excellent step coverage at  extremely low power levels. The system meets all safety, facility and process  requirements within the laboratory and pilot line production environments. The  Minilock-Orion III has many standard features not typically found on a system  so reasonably priced, which is why many users worldwide have made it their  PECVD system of choice.

Applications

MEMS, Solid State Lighting, Failure Analysis, Research & Development, Pilot Line.

 

alt Brochure - Minilock-Orion III PECVD System with a Vacuum Loadlock

 


 

 

Minilock-Phantom III

Reactive Ion Etcher (RIE) with a Vacuum Loadlock

The Minilock-Phantom III is the first RIE system in the industry to incorporate a vacuum load-lock on a compact platform. The system has been designed to meet all the safety and equipment needs for the most challenging processes including etch applications that require corrosive chemistries.

Because metal and compound semiconductor etch processes use corrosive chemistries and are often sensitive to atmospheric moisture, consistent results as well as safety depend upon isolating the reaction chamber from the atmosphere. In addition, when operating at lower pressure, maintaining reproducible results from run to run is impacted when the chamber is exposed to the atmosphere between each run. The Minilock- Phantom III solves these and other issues with its fully integrated load-locked delivery system

Applications

Compound Semiconductor, Failure Analysis, Research & Development, Pilot Line.

 

alt Brochure - Minilock-Phantom III RIE with a Vacuum Loadlock

 


 

 

 Check out more Trion Technology products, click here.